Puritas 99.9% Nano Tantalum Pulvis / Tantalum Nanoparticles / Tantalum Nanopowder
Productum parametri
| Product Name | Tantalum pulveris |
| Notus | Hsg |
| Exemplar | HSG-VII |
| Materia | Tantalum |
| Pudicitia | 99.9% -99.99% |
| Colo | Griseo |
| Figura | Pulverem |
| Characteres | Tantalum est silvery metallum quod est mollis in pura forma. Est fortis et ductilibus metallum et temperaturis infra CL ° C (CCCII ° F) hoc metallum est satis immune ad chemical impetus. Notum est repugnant ad corrosio ut ostendat et cadmiae amet super superficiem |
| Applicatio | Usus est sicut dictum est in speciali alloys ferrea et non-ferrea metalla. Aut propter electronic industria et scientificam investigationis et experimentis |
| Moq | 50kg |
| Sarcina | Vacuum aluminium ffoyle sacculos |
| Repono | Sub aridam et frigus conditione |
Chemical compositionem
| Nomen: Tantalum pulveris | Spec: * | ||
| Chemicals:% | Size: 40-400mesh, micron | ||
| Ta | 99,9% min | C | 0.001% |
| Si | 0.0005% | S | <0.001% |
| P | <0.003% | * | * |
Descriptio
Tantalum est unus de Rarissae elementorum in terris.
Hoc platinum griseo coloratum metallum habet densitatem 16.6 g / CM3 quae est duplicia, sicut densa sicut ferro, et liquescens punctum II, CMXCVI ° C Fleor quarta omnium metallorum. Meanwhile, it is highly ductile at high temperatures, very hard and excellent thermal and electrical conductor properties.Tantalum powder is classified into two types according to application:tantalum powder for powder metallurgy and tantalum powder for capacitor. Tantalum metallurgical powder produced by UMM is characterized by particularly fine grain sizes and can be easily formed into tantalum rod, bar,sheet, plate, sputter target and so on, together with high purity, and absolutely meets all customer's requirements.
Tabula ⅱ permissibilis varietates diametrum pro tantalum virgas
| Diametro, inch (mm) | Tolerantia, +/- digiti (mm) |
| 0.125 ~ 0.187 excl (3.175 ~ 4.750) | 0.003 (0.076) |
| 0.187 ~ 0.375 excl (4.750 ~ 9.525) | 0.004 (0.102) |
| 0.375 ~ 0.500 excl (9.525 ~ 12.70) | 0.005 (0.127) |
| 0.500 ~ 0.625 excl (12.70 ~ 15.88) | 0.007 (0.178) |
| 0.625 ~ 0.750 excl (15.88 ~ 19.05) | 0.008 (0.203) |
| 0.750 ~ 1.000 excl (19.05 ~ 25.40) | 0.010 (0.254) |
| 1.000 ~ 1.500 excl (25.40 ~ 38.10) | 0.015 (0.381) |
| 1.500 ~ 2.000 excl (38.10 ~ 50.80) | 0.020 (0.508) |
| 2.000 ~ 2.500 excl (50.80 ~ 63.50) | 0.030 (0.762) |
Applicatio
Tantalum metallurgical pulveris est maxime propter producendo tantalum spundering target, tertia maxima application pro tantalis pulveris, sequenti capacitors et superalloys, quod est in semiconductor applications in dolor electronics industria.
Tantalum metallurgical pulveris etiam propter dispensando in Tantalum virga, talea, filum, sheet, laminam.
With malleability, high temperature resistance and corrosion resistance, tantalum powder is widely used in chemical industry, electronics, military, mechanical and aerospace industries, to manufacture electronic components, heat-resistant materials, corrosion-resistant equipment, catalysts, dies, advanced optical glass Et sic porro. Tantalum Powder etiam in medicinae examen, chirurgicam materiae et contra agens ..
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