Tantalum Block Tantalum Target Pure Tantalum Ingot
Morbi condimentum
| Product Name | Plumbum densum altum roboris 99,95% ta1 R05200 purum tantalum ingot pretium |
| Puritas | 99.95% min |
| Gradus | R05200, R05400, R05252, RO5255, R05240 |
| Standard | ASTM B708, GB/T 3629 |
| Magnitudo | Item;Crassitudo (mm);Latitudo (mm);Longitudo (mm) |
| Foil;0.01-0.09;30-150;>200 | |
| Sheet;0.1-0.5;30- 609.6;30-1000 | |
| lamella;0.5-10;50-1000;50-2000 | |
| Conditio | 1. Hot-volutus/Frigus-volutus;2. Alkaline Purgatio;3. Electrolytic Poloniae;4. Machining, molere;5. Suspendisse subsidio furnum |
| Mechanica proprietas (Annealed) | Gradus;Roboris distrahentes min;Min cede vires min Elongation, %(UNS);psi (MPa);psi(MPa)(2%);(1in. longitudo vadium) |
| (RO5200, RO5400);30000 (207);20000 (138);20 | |
| Ta-10W (RO5255);70000 (482);60000 (414);15 | |
| Ta-2.5W (RO5252);40000 (276);30000 (207);20 | |
| Ta-40Nb (RO5240);35000 (241);20000 (138);25 | |
| nativus products | Secundum trahentem, requisita specialia a venditore et emptore conveniant. |
Tantalum Grade & compositione
| Rate% | |||||||||||||
| Gradus | Praecipua compositio | immunditia % max | |||||||||||
| Ta | Nb | Fe | Si | Ni | W | Mo | Ti | Nb | O | C | H | N | |
| Ta1 | Libra | -- | 0.005 | 0.005 | 0.002 | 0.01 | 0.01 | 0.002 | 0.03 | 0.014 | 0.01 | 0.0015 | 0.01 |
| Ta2 | Libra | -- | 0.03 | 0.02 | 0.005 | 0.04 | 0.03 | 0.005 | 0.1 | 0.02 | 0.01 | 0.0015 | 0.01 |
| TaNb3 | Libra | <3.5 | 0.03 | 0.03 | 0.005 | 0.04 | 0.03 | 0.005 | -- | 0.02 | 0.01 | 0.0015 | 0.01 |
| Ta2.5W (RO5252) | Libra | 0.005 | 0.005 | 0.002 | 3.0 | 0.01 | 0.002 | 0.04 | 0.014 | 0.01 | 0.0015 | 0.01 | |
| Ta10W (RO5255) | Libra | 0.005 | 0.005 | 0.002 | 11 | 0.01 | 0.002 | 0.04 | 0.014 | 0.01 | 0.0015 | 0.01 | |
Omnes Tantalum products praesto
| Product nomen | Gradus | Standard |
| Tantalum ingot | (Ta) RO5200, RO5400;RO5252(Ta-2.5W);RO5255(Ta-10W) | ASTMB708-98;ASTM521- 92;ASTM521-98;ASTMB365,ASTM B365-98 |
| Tantalum vectes | ||
| Tantalum tube | ||
| Tantalum filum | ||
| Tantalum sheet | ||
| Tantalum uasculum | ||
| Tantalum target | ||
| Tantalum partes |
Feature
bonum ductilis
Bonum MOLLITIA
Optimum acidum resistentia
Altum liquescens punctum, altum fervens punctum
Minuissima coefficientium scelerisque expansionem
Bonam facultatem absorbendi et solvendi hydrogenii
Applicationem
Late adhibentur in electronicis, aviationibus et instrumento lectronico Industry, industria ferri, industria chemica, industria energia atomica, aerospace aeroplano, carbide coagulo, curatione medica.
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