Circum puritatem per figura 99.95% MO Material 3n5 Molybdenum spundering scopum ad speculum meminit & ornamentum
Productum parametri
| Notam nomen | HSG Metal |
| Model Number | HSG-Moly Target |
| Gradus | Mo1 |
| Melting Point (℃) | MMDCXVII |
| Processu | Sincering / Forged |
| Figura | Speciale figura partes |
| Materia | Pura Molybdenum |
| Chemical compositionem | Mo:> = 99.95% |
| Certificatorium | ISO9001: MMXV |
| Vexillum | ASTM B386 |
| Superficies | Clara et terram superficiem |
| Densitas | 10.28g / CM3 |
| Colo | Metallicis PLENUS |
| Pudicitia | Mo:> = 99.95% |
| Applicatio | PVD coating film in speculo industria, Ion plating |
| Commodum | Summus temperatus resistentia, princeps castitatis, melius corrosio resistentia |
Standard disponibilitate describitur infra. Alia moles et tolerances sunt available.
| Crassities | Max. Latitudo | Max. Longitudo |
| .090 " | XXIV " | CX " |
| .125 " | XXIV " | LXXX " |
| .250 " | XXIV " | XL " |
| .500 " | XXIV " | XXIV " |
| > .500 " | XXIV " |
Nam maius crassitudine, laminam products sunt Northmanni limited ad XL kilograms maximum pondus per piece.molybdenum laminam vexillum crassitudine tolerantia
| Crassities | .25 "ad VI" | VI "ad XII" | XII "ad XXIV" |
| .090 " | ± .005 " | ± .005 " | ± .005 " |
| > .125 | ± IV% | ± IV% | ± IV% |
Molybdenum laminam vexillum width tolerantia
| Crassities | .25 "ad VI" | VI "ad XII" | XII "ad XXIV" |
| .090 " | ± .031 " | ± .031 " | ± .031 " |
| > .125 | ± .062 " | ± LXII " | ± LXII " |
Nota
Sheet (0.13MM ≤thickness ≤ 4.75mm)
Plate (Crassitudo> 4.75mm)
Alia ratio potest agi.
Molybdenum target est industriae materia, late in PROLIXUS speculum, STN / TN / tft-LCD, optical speculum, Ion coating et alia industries. Est idoneam omnibus plana coating et nent coating systems.
Et Molybdenum scopum habet density de 10.2 g / CM3. Et liquescens punctum est MMDCX c. Ferveretur punctum (V) DLX ° c.
Puritas Molybdenum target: 99.9%, 99.99%
Specifications: per target, laminam target, rotating target
Pluma
Optimum conductivity of electricity;
Resistentia caliditas;
Altus liquescens punctum, excelsum oxidatio et exesa resistentia.
Applicatio
Latite usus est ut electrodes vel wiring materiales in semiconductor integrated circuitu, plana panel ostentationem et solaris panel vestibulum et aliis agris. In eodem tempore, habemus productio Tungsten, tantalis target, niobium scopum, aeris scopum, in specifica dimensiones productionis secundum Customer elit.
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