R05200 R05400 Maximum puritas TA1 0.5mm Crassitudo Tantalum Plate TA Sheet Price
Morbi condimentum
| Item | 99,95% pura R05200 R05400 |
| Puritas | 99.95% min |
| Gradus | R05200, R05400, R05252, R05255, R05240 |
| Standard | ASTM B708, GB/T 3629 |
| Ars | 1.Hot-volutus/Frigus-volutus; 2.Alkaline Purgatio;3.Electrolytic Polish; 4.Machining, stridor; 5.Stress subsidio annealing |
| Superficies | Limatus, stridor |
| nativus products | Secundum trahentem, peculiares requiruntur ut a venditore et emptore conveniant. |
| Feature | princeps ductilis, corrosio resistentia, alta desity |
| Applicationem | Petroleum, Aerospace, Mechanica, Chemical |
Specification
| Dimensiones | |||
| Item | Crassitudo / mm * | Latitudo/mm | Longitudo / mm * |
| Foil | 0.05 | 300 | >200 |
| Sheet | 0.1--0.5 | 30- 609.6 | 30-1000 |
| Plate | 0.5--10 | 50-1000 | 50-2000 |
Mechanica necessaria
| Gradu et magnitudine | Annealed | ||
| distrahentes viresmin, psi (MPa) | Cedant vires min,psi (MPa)(2%) | Prolongatio min, % (1 longitudinis digiti vadium) | |
| Sheet, foll. et tabula (RO5200, RO5400) Crassitudo<0.060" (1.524mm)Crassitudo ≥0.060" (1.524mm) | 300000 (207) | 20000 (138) | 20 |
| 25000 (172) | 15000 (103) | 30 | |
| Ta-10W (RO5255)Sheet, foll. et tabula | 70000 (482) | 60000 (414) | 15 |
| 70000 (482) | 55000 (379) | 20 | |
| Ta-2.5W (RO5252)Crassitudo <0.125" (3.175mm) Crassitudo 0.125" (3.175mm) | 40000 (276) | 300000 (207) | 20 |
| 40000 (276) | 22000 (152) | 25 | |
| Ta-40Nb (RO5240)Crassitudo<0.060" (1.524mm) | 40000 (276) | 20000 (138) | 25 |
| Crassitudo>0.060" (1.524mm) | 35000 (241) | 15000 (103) | 25 |
Chemical compositione
| Chemia (%) | |||||||||||||
| Designatio | dux component | immunditias maxmium | |||||||||||
| Ta | Nb | Fe | Si | Ni | W | Mo | Ti | Nb | O | C | H | N | |
| Ta1 | Residuum | 0.004 | 0.003 | 0.002 | 0.004 | 0.006 | 0.002 | 0.03 | 0.014 | 0.004 | 0.0015 | 0.002 | |
| Ta2 | Residuum | 0.01 | 0.01 | 0.005 | 0.02 | 0.02 | 0.005 | 0.08 | 0.02 | 0.01 | 0.0015 | 0.01 | |
Features
* Bonum ductilis
* Bonum MOLLITIA
* Praeclara acid-resistentia
* Altum liquescens punctum, altum fervens punctum
* Minuissimum coefficientium scelerisque expansion
* Bene facultatem absorbendi et solvendi hydrogenii
Applicationem
Tantalum varias admixtionum genera producere solebat cum summo liquefactio puncto, viribus et malleabili.
Per commixtionem cum aliis metallis, instrumenta carbida coagulo fabricare possumus instrumenta ad processui metallicam, partes machinæ chemicae, apparatum chemicum, reactores nuclei, partes missiles, commutatores caloris, superalloca pro piscinis et vasis, etc. ad usus usus.
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